Abstract

GARCIA, DANNA; PIRATOBA, ULISES  and  MARINO, ALVARO. (Ti,Al)N COATINGS ON AISI 4140 BY R.F. SPUTTERING. Dyna rev.fac.nac.minas [online]. 2007, vol.74, n.152, pp.181-185. ISSN 0012-7353.

TiAlN films were deposited by rf magnetron sputtering onto AISI 4140 steel substrates. A mixed target of metallic Ti and Al with a nominal composition of 60 atom% Ti and 40 atom% Al was used. The substrate temperature was varied between 260 ºC and 330 ºC, at a PN₂/PAr pressure ratio of about 0.1. Coatings of different thickness were obtained, varying the time deposition between 2 and 4,5 hours. The chemical composition of the films was determined by EDX, and the surface topography by AFM. The electrochemical behavior, determined by EIS and TAFEL, and the micro - hardness were analyzed; the coatings displayed mainly a granular structure with small and regular grains.

Keywords : Hard coatings; (Ti,Al)N; Sputtering rf..

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