versión impresa ISSN 0012-7353
TiAlN films were deposited by rf magnetron sputtering onto AISI 4140 steel substrates. A mixed target of metallic Ti and Al with a nominal composition of 60 atom% Ti and 40 atom% Al was used. The substrate temperature was varied between 260 ºC and 330 ºC, at a PN2/PAr pressure ratio of about 0.1. Coatings of different thickness were obtained, varying the time deposition between 2 and 4,5 hours. The chemical composition of the films was determined by EDX, and the surface topography by AFM. The electrochemical behavior, determined by EIS and TAFEL, and the micro - hardness were analyzed; the coatings displayed mainly a granular structure with small and regular grains.
Palabras llave : Hard coatings; (Ti,Al)N; Sputtering rf..