Resumo

OLAYA, Jhon Jairo; MARULANDA, Diana Maritza  e  RODIL, Sandra. Preferential orientation in metal nitride deposited by the UBM system. Ing. Investig. [online]. 2010, vol.30, n.1, pp.125-129. ISSN 0120-5609.

This work was aimed at studying the influence of ion bombardment on the preferred orientation (OP) of transition metal nitrides (TMN) produced by the reactive sputtering technique with a variable unbalanced magnetron through permanent magnets. Titanium nitride (TiN) coatings were thus studied by varying two parameters: ion-atom ratio on the substrate (Ji/Ja) and nitrogen flux. Deposition conditions were as follows: 7 mTorr working pressure, ~ 380ºC substrate temperature, 2 and 8.5 sccm nitrogen flux and 245-265 discharge power. The results showed that preferred orientation (111) and the crystalline behaviour of the produced coatings depended more on nitrogen flux than on ion bombardment. Similarly, micro-hardness measured on films deposited on steel AISI-M2 substrates increased from 1600 to 2000 HV0.025 when nitrogen flux was increased.

Palavras-chave : metal nitride; unbalanced magnetron; UBM; reactive sputtering.

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