Resumo

GONZALEZ, Diego Luis; CAMARGO, Manuel A.  e  SANCHEZ M, Julián A.. Diffusion and Deposition Rates in a Colloidal Model for Epitaxial Growth. rev. cienc. [online]. 2017, vol.21, n.1, pp.37-52. ISSN 0121-1935.  https://doi.org/10.25100/rc.v21i1.6345.

We analyze the dynamical properties of a two-dimensional colloidal suspension model, whose particles are slowly deposited on a one-dimensional substrate due to the influence of an external field. Once the particles are deposited on the substrate they can laterally diffuse on it. Using an analytical model based on the Langevin and the Fokker- Plank equations, the dynamics of a particle in the suspension and on the substrate, are studied. In particular, we evaluate the average deposition rate on the substrate, ℱ, as well as the diffusion constant of the particles on the substrate D. The proposed analytical model gives results that agree well with those found using numerical simulations based on molecular dynamics. This simple model allows to explore the possibility to use colloids for the formation of structures through the epitaxial growth technique, which is relevant in several application fields.

Palavras-chave : monolayer growth; stochastic models; molecular dynamics; colloidal suspensions.

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