Abstract

GALLEGO CANO, Jorge Luis et al. CN_xthin films grown by PLD at different temperatures. Ing. Desarro. [online]. 2011, vol.29, n.1, pp.50-60. ISSN 0122-3461.

Carbon Nitride (CNx) thin films were grown by pulsed laser deposition using a Nd:YAG laser (1064 nm, 500mJ), in a graphite target (99.999%) on Si(100) substrate for three different temperatures 21, 50 and 200 °C, in a nitrogen atmosphere at constant pressure of 2,66 Pa. The FTIR's analysis made to the films, revealed the presence of active modes around 1108 cm^-1, 1465 cm^-1, 2270 cm^-1, associated with the simple, double and triple bonding of CN, respectively. Chemical composition was studied by EDX analysis, low nitrogen contents were found between 3 and 6 at%. And the mechanical properties of the films were evaluated using nanoindentation technique. The highest hardness was 14 GPa at 200°C substrate temperature.

Keywords : Carbon Nitride; Nanoindentation; Pulsed Laser Deposition.

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