Resumo

PRIETO-NOVOA, Gina Milena; BORJA-GOYENECHE, Estrella Natali  e  OLAYA-FIOREZ, Jhon Jairo. Effect of Ni content on the optical and electrical properties of ZrTiSiNiN thin films deposited by co-sputtering. Rev. acad. colomb. cienc. exact. fis. nat. [online]. 2019, vol.43, n.168, pp.366-374. ISSN 0370-3908.  https://doi.org/10.18257/raccefyn.840.

Thin films of ZrTiSiNiN have been deposited onto a glass and silicon substrates by reactive magnetron co-sputtering of pure Ti5Si2, Zr alloy targets. In this investigation was located Ni pieces on Zr target in order to change the Ni amount in the films. The surface morphology and crystalline structure of the films were investigated by scanning electronic microscope (SEM), X-ray diffraction (XRD) and interferometry respectively. The electrical resistivity was measured by the four-point probe method and their optical properties were characterized by ultraviolet/visible (UV/ Vis) spectroscopy. XRD results showed that nickel works as a grain refiner because the crystallite size is reduced from 27 nm to 15 nm when the Ni concentration increases from 0 to% to 6.8 to%. Both the electrical resistance and the optical "band gap" of the coatings increased with the decrease in crystallite size because of the increase in the density of grain boundaries and the quantum confinement effect.

Palavras-chave : ZrTiSiNiN; Optical properties; Electrical resistivity; Sputtering.

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