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Revista EIA
versão impressa ISSN 1794-1237versão On-line ISSN 2463-0950
Resumo
MONTOYA-TORRES, Jairo R. MODÉLISATION CONCEPTUELLE D´UNE UNITÉ DE FABRICATION MICROÉLECTRONIQUE. Rev.EIA.Esc.Ing.Antioq [online]. 2007, n.7, pp.9-24. ISSN 1794-1237.
The modelling of industrial systems is a very hard task because of both the number and diversity of parameters to take into account, and the complex relations between these parameters. In this paper, we are interested on the study of a fully automated Integrated Circuit (IC) semiconductor manufacturing plant (fab). In the semiconductor literature, fab behaviour analysis has very often been performed using discrete-event simulation models, but little work has been devoted to the conceptualisation of the modelling approach. Other works focus on the analysis of single parts of the fab, by simplifying the relations between its components. In such a context, the aim of this paper is to use formal methodologies to model all the components of a wafer fab, that is, its physical and control systems, as well as the fabrication process. This model specification can then be used to build a simulation model for the dynamic factory behaviour analysis.
Palavras-chave : modelling; semiconductors; process-interaction approach; Petri nets.